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Fabrication of MBE high-k MOSFETs in a standard CMOS flow

dc.contributor.authorPantisano, Luigi
dc.contributor.authorConard, Thierry
dc.contributor.authorSchram, Tom
dc.contributor.authorDeweerd, Wim
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorRittersma, C.
dc.contributor.authorMarchiori, C.
dc.contributor.authorSousa, M.
dc.contributor.authorFompeyrine, F.
dc.contributor.authorLocquet, J.P.
dc.date.accessioned2021-10-16T18:26:25Z
dc.date.available2021-10-16T18:26:25Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12668
dc.sourceIIOimport
dc.titleFabrication of MBE high-k MOSFETs in a standard CMOS flow
dc.typeBook chapter
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage364
dc.source.bookAdvanced Gate-Stacks for High-Mobility Semiconductors
dc.source.endpage374
imec.availabilityPublished - open access
imec.internalnotesSpringer Series in Advanced Microelectronics; Vol. 27


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