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Transmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation

dc.contributor.authorJin, S.
dc.contributor.authorBender, Hugo
dc.contributor.authorLi, Xiuqiong
dc.contributor.authorDong, C.
dc.contributor.authorZhang, Zheng
dc.date.accessioned2021-09-29T14:37:12Z
dc.date.available2021-09-29T14:37:12Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1285
dc.sourceIIOimport
dc.titleTransmission electron microscopic study of new FeSi2 and TiSi2 phases prepared by ion implantation
dc.typeOral presentation
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.conferenceEUREM96 - XIth European Congress on Microscopy; August 26-30, 1996; Dublin, Ireland.
dc.source.conferencelocation
imec.availabilityPublished - imec


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