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Progress and challenges of 193nm and EUV lithography for sub-32nm scaling

dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-18T20:59:13Z
dc.date.available2021-10-18T20:59:13Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17905
dc.sourceIIOimport
dc.titleProgress and challenges of 193nm and EUV lithography for sub-32nm scaling
dc.typeOral presentation
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference36th International Conference on Micro & Nano Engineering - MNE
dc.source.conferencedate19/09/2010
dc.source.conferencelocationGenua Italy
imec.availabilityPublished - open access
imec.internalnoteskeynote


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