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Multiple patterning: a path towards sub-20nm hp

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVersluijs, Janko
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-18T23:19:02Z
dc.date.available2021-10-18T23:19:02Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18212
dc.sourceIIOimport
dc.titleMultiple patterning: a path towards sub-20nm hp
dc.typeOral presentation
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceSemicon Japan
dc.source.conferencedate1/12/2010
dc.source.conferencelocationChiba Japan
imec.availabilityPublished - open access


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