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Ultra-low-k by CVD: deposition and curing

dc.contributor.authorJousseaume, Vincent
dc.contributor.authorZenasni, Aziz
dc.contributor.authorGourhant, Olivier
dc.contributor.authorFavennec, Laurent
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T11:58:13Z
dc.date.available2021-10-20T11:58:13Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20881
dc.sourceIIOimport
dc.titleUltra-low-k by CVD: deposition and curing
dc.typeBook chapter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage35
dc.source.bookAdvanced Interconnects for ULSI Technology
dc.source.endpage78
imec.availabilityPublished - open access


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