Show simple item record

2D and 3D photoresist line roughness characterization

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorKunnen, Eddy
dc.contributor.authorPargon, Erwine
dc.contributor.authorLuere, Olivier
dc.contributor.authorBianchi, Davide
dc.date.accessioned2021-10-20T17:21:12Z
dc.date.available2021-10-20T17:21:12Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21659
dc.sourceIIOimport
dc.title2D and 3D photoresist line roughness characterization
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conference38th International Micro & Nano Engineering Conference - MNE
dc.source.conferencedate10/09/2012
dc.source.conferencelocationTolouse France
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record