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Impact of extreme UV mask flatness on resist roughness

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorYounkin, Todd
dc.contributor.authorLeeson, Michael
dc.contributor.authorPei-Yang, Yan
dc.date.accessioned2021-10-20T17:22:38Z
dc.date.available2021-10-20T17:22:38Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21662
dc.sourceIIOimport
dc.titleImpact of extreme UV mask flatness on resist roughness
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conferenceWilhelm and Else Heraeus Physics School
dc.source.conferencedate10/07/2012
dc.source.conferencelocationBad Honnef Germany
imec.availabilityPublished - imec


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