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Front end of the line process

dc.contributor.authorHan, Jeong Hwan
dc.contributor.authorCho, Moon Ju
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPark, Tae Joo
dc.contributor.authorHwang, cheol seong
dc.date.accessioned2021-10-22T01:50:03Z
dc.date.available2021-10-22T01:50:03Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23902
dc.sourceIIOimport
dc.titleFront end of the line process
dc.typeBook chapter
dc.contributor.imecauthorDelabie, Annelies
dc.source.peerreviewno
dc.source.beginpage175
dc.source.bookAtomic Layer Deposition for Modern Semiconductor Devices
dc.source.endpage208
imec.availabilityPublished - imec
imec.internalnotesChapter 7 ISBN 978-1-4614-8053-2


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