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Wafer scale produced SERS substrates using state-of-the art optical lithography

dc.contributor.authorVan Dorpe, Pol
dc.date.accessioned2021-10-22T07:10:57Z
dc.date.available2021-10-22T07:10:57Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24691
dc.sourceIIOimport
dc.titleWafer scale produced SERS substrates using state-of-the art optical lithography
dc.typeOral presentation
dc.contributor.imecauthorVan Dorpe, Pol
dc.contributor.orcidimecVan Dorpe, Pol::0000-0003-0918-1664
dc.source.peerreviewno
dc.source.conferenceSurface-Enhanced Spectroscopies
dc.source.conferencedate7/08/2014
dc.source.conferencelocationChemnitz Germany
imec.availabilityPublished - imec


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