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Lithography simulation with aerial image-variable threshold resist model

dc.contributor.authorRandall, John
dc.contributor.authorGangala, Hareen K
dc.contributor.authorTritchkov, Alexander
dc.date.accessioned2021-10-01T08:45:41Z
dc.date.available2021-10-01T08:45:41Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2893
dc.sourceIIOimport
dc.titleLithography simulation with aerial image-variable threshold resist model
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceMNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
dc.source.conferencelocation
imec.availabilityPublished - imec


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