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Scatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices

dc.contributor.authorCrotti, Davide
dc.contributor.authorSwerts, Johan
dc.contributor.authorYasin, Farrukh
dc.contributor.authorJossart, Nico
dc.contributor.authorSouriau, Laurent
dc.contributor.authorKundu, Shreya
dc.contributor.authorUrenski, Ronen
dc.contributor.authorUrbanowicz, Adam M.
dc.contributor.authorKoret, Roy
dc.contributor.authorFigueiro, Nivea
dc.contributor.authorSendelbach, Matthew
dc.contributor.authorLee, Wei Ti
dc.contributor.authorShah, Kavita
dc.contributor.authorLarson, Tom
dc.contributor.authorGer, Avron
dc.contributor.authorWolfling, Shay
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-25T17:29:47Z
dc.date.available2021-10-25T17:29:47Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30476
dc.sourceIIOimport
dc.titleScatterometry and X-ray metrology for in-line control of spin-transfer torque magnetic random access memory (STT-MRAM) devices
dc.typeOral presentation
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorJossart, Nico
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced Lithography Conference
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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