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Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes

dc.contributor.authorHalder, Sandip
dc.contributor.authorCerbu, Dorin
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-25T19:28:01Z
dc.date.available2021-10-25T19:28:01Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30837
dc.sourceIIOimport
dc.titleUsing machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes
dc.typeOral presentation
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorCerbu, Dorin
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewno
dc.source.conferenceSPIE International Conference on Extreme Ultraviolet Lithography 2018
dc.source.conferencedate15/09/2018
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://spie.org/PUV18/conferencedetails/international-conference-extreme-ultraviolet-lithography
imec.availabilityPublished - imec
imec.internalnotes10809-12


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