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CD control using SiON BARL processing for sub 0.25µm lithography

dc.contributor.authorZhang, Fenghong
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorGangala, Hareen K
dc.contributor.authorGopalan, P.
dc.contributor.authorConley, P.
dc.contributor.authorDusa, M.
dc.contributor.authorBendik, Joe
dc.date.accessioned2021-10-01T09:52:04Z
dc.date.available2021-10-01T09:52:04Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3168
dc.sourceIIOimport
dc.titleCD control using SiON BARL processing for sub 0.25µm lithography
dc.typeOral presentation
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conferenceMNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
dc.source.conferencelocation
imec.availabilityPublished - imec


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