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Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists

dc.contributor.authorVesters, Yannick
dc.date.accessioned2021-10-27T22:49:49Z
dc.date.available2021-10-27T22:49:49Z
dc.date.issued2019-04
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34388
dc.sourceIIOimport
dc.titleLight-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists
dc.typePHD thesis
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorDe Gendt, Stefan
dc.contributor.thesisadvisorDe Simone, Danilo
dc.identifier.urlhttps://limo.libis.be/primo-explore/fulldisplay?docid=LIRIAS2379237&context=L&vid=Lirias&search_scope=Lirias&tab=default_tab&lang=en_US&fromSitemap=1
imec.availabilityPublished - open access


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