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Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)

dc.contributor.authorOnitsuka, Tomoya
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorDauendorffer, Arnaud
dc.contributor.authorShimura, Satoru
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorFoubert, Philippe
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2021-11-02T15:58:32Z
dc.date.available2021-11-02T15:58:32Z
dc.date.issued2021
dc.identifier.isbn978-1-5106-4051-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000672825700034
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37692
dc.sourceWOS
dc.titleNovel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2583809
dc.identifier.eisbn978-1-5106-4052-8
dc.source.numberofpages7
dc.source.peerreviewyes
dc.source.conferenceConference on Extreme Ultraviolet (EUV) Lithography XII
dc.source.conferencedateFEB 22-26, 2021
dc.source.volume11609
imec.availabilityUnder review


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220.500.12860/37692.22023-01-17T08:10:46Zvalidation by library/open access desk
120.500.12860/37692*2021-11-02T15:58:32Z

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