EUV Single Patterning Exploration for Pitch 28 nm

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dc.contributor.author	Xu, Dongbo
dc.contributor.author	Gillijns, Werner
dc.contributor.author	Drissi, Youssef
dc.contributor.author	Tan, Ling Ee
dc.contributor.author	Oak, Apoorva
dc.contributor.author	Kim, Ryan Ryoung han
dc.date.accessioned	2021-11-02T15:59:40Z
dc.date.available	2021-11-02T15:59:40Z
dc.date.issued	2021
dc.identifier.issn	0277-786X
dc.identifier.other	WOS:000672647800018
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/37771
dc.source	WOS
dc.title	EUV Single Patterning Exploration for Pitch 28 nm
dc.type	Proceedings paper
dc.contributor.imecauthor	Xu, Dongbo
dc.contributor.imecauthor	Gillijns, Werner
dc.contributor.imecauthor	Drissi, Youssef
dc.contributor.imecauthor	Tan, Ling Ee
dc.contributor.imecauthor	Oak, Apoorva
dc.contributor.imecauthor	Kim, Ryan Ryoung han
dc.contributor.orcidimec	Xu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimec	Gillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimec	Tan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimec	Oak, Apoorva::0000-0002-0926-848X
dc.identifier.doi	10.1117/12.2584730
dc.identifier.eisbn	978-1-5106-4062-7
dc.source.numberofpages	12
dc.source.peerreview	yes
dc.source.conference	Conference on Design-Process-Technology Co-optimization XV
dc.source.conferencedate	FEB 22-26, 2021
dc.source.volume	11614
imec.availability	Under review

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Version	Item	Date	Summary
3	20.500.12860/37771.3	2022-06-24T07:49:57Z	validation by library/open access desk
2	20.500.12860/37771.2	2022-05-05T06:53:31Z	validation by imec author
1	20.500.12860/37771*	2021-11-02T15:59:40Z

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