Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection

This is not the latest version of this item. The latest version can be found at: https://imec-prod.atmire.com/handle/20.500.12860/38204.3

dc.contributor.author	Chakroun, Imen
dc.contributor.author	Ashby, Tom
dc.contributor.author	Das, Sayantan
dc.contributor.author	Halder, Sandip
dc.contributor.author	Wuyts, Roel
dc.contributor.author	Verachtert, Wilfried
dc.date.accessioned	2022-04-04T07:56:26Z
dc.date.available	2021-11-02T16:05:16Z
dc.date.available	2022-04-04T07:56:26Z
dc.date.issued	2020
dc.identifier.issn	na
dc.identifier.other	WOS:000615717400031
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/38204.2
dc.source	WOS
dc.title	Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection
dc.type	Proceedings paper
dc.contributor.imecauthor	Chakroun, Imen
dc.contributor.imecauthor	Ashby, Tom
dc.contributor.imecauthor	Das, Sayantan
dc.contributor.imecauthor	Halder, Sandip
dc.contributor.imecauthor	Wuyts, Roel
dc.contributor.imecauthor	Verachtert, Wilfried
dc.contributor.orcidimec	Das, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimec	Halder, Sandip::0000-0002-6314-2685
dc.identifier.doi	10.5220/0008877502730279
dc.identifier.eisbn	978-989-758-397-1
dc.source.numberofpages	7
dc.source.peerreview	yes
dc.source.beginpage	273
dc.source.endpage	279
dc.source.conference	9th International Conference on Pattern Recognition Applications and Methods (ICPRAM)
dc.source.conferencedate	FEB 22-24, 2020
dc.source.conferencelocation	Valletta
dc.source.journal	na
imec.availability	Published - imec

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Version	Item	Date	Summary
3	20.500.12860/38204.3	2022-01-27T17:10:35Z	validation by library/open access desk
2	20.500.12860/38204.2*	2022-01-27T17:10:33Z	validation by library/open access desk
1	20.500.12860/38204	2021-11-02T16:05:16Z

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