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High yield and process uniformity for 300 mm integrated WS2 FETs

dc.contributor.authorSchram, Tom
dc.contributor.authorSmets, Quentin
dc.contributor.authorRadisic, Dunja
dc.contributor.authorGroven, Benjamin
dc.contributor.authorThiam, Arame
dc.contributor.authorLi, Waikin
dc.contributor.authorDupuy, Emmanuel
dc.contributor.authorVandersmissen, Kevin
dc.contributor.authorMaurice, Thibaut
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorRadu, Iuliana
dc.date.accessioned2021-11-19T13:21:51Z
dc.date.available2021-11-19T13:21:51Z
dc.date.issued2021
dc.identifier.issnNA
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38445
dc.titleHigh yield and process uniformity for 300 mm integrated WS2 FETs
dc.typeMeeting abstract
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorThiam, Arame
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorDupuy, Emmanuel
dc.contributor.imecauthorVandersmissen, Kevin
dc.contributor.imecauthorMaurice, Thibaut
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimec0000-0003-1533-7055
dc.contributor.orcidimecSchram, Tom
dc.contributor.orcidimecSmets, Quentin
dc.contributor.orcidimecGroven, Benjamin
dc.contributor.orcidimecDupuy, Emmanuel
dc.contributor.orcidimecRadu, Iuliana
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecDupuy, Emmanuel::0000-0003-3341-1618
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.numberofpages2
dc.source.peerreviewyes
dc.subject.disciplineElectrical & electronic engineering
dc.source.beginpage1
dc.source.endpage2
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate13-19 /6/ 2021
dc.source.conferencelocationkyoto virtual
dc.source.journalNA
imec.availabilityPublished - open access


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220.500.12860/38445.22022-09-22T09:04:04Zvalidation by library/open access desk
120.500.12860/38445*2021-11-19T13:21:51Z

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