Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space

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dc.contributor.author	Thiam, A.
dc.contributor.author	Santaclara, J. G.
dc.contributor.author	Franke, J-H
dc.contributor.author	Schleicher, F.
dc.contributor.author	Blanc, R.
dc.contributor.author	Bezard, P.
dc.contributor.author	Moussa, A.
dc.contributor.author	Hendrickx, E.
dc.contributor.author	Wong, P.
dc.contributor.author	Maslow, M. J.
dc.date.accessioned	2022-05-22T02:19:05Z
dc.date.available	2022-05-22T02:19:05Z
dc.date.issued	2021
dc.identifier.isbn	978-1-5106-4552-3
dc.identifier.issn	0277-786X
dc.identifier.other	WOS:000792657300005
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/39868
dc.source	WOS
dc.title	Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
dc.type	Proceedings paper
dc.contributor.imecauthor	Thiam, A.
dc.contributor.imecauthor	Franke, J-H
dc.contributor.imecauthor	Schleicher, F.
dc.contributor.imecauthor	Blanc, R.
dc.contributor.imecauthor	Bezard, P.
dc.contributor.imecauthor	Moussa, A.
dc.contributor.imecauthor	Hendrickx, E.
dc.contributor.imecauthor	Wong, P.
dc.identifier.doi	10.1117/12.2601839
dc.identifier.eisbn	978-1-5106-4553-0
dc.source.numberofpages	14
dc.source.peerreview	yes
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	SEP 27-OCT 01, 2021
dc.source.volume	11854
imec.availability	Under review

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Version	Item	Date	Summary
2	20.500.12860/39868.2	2022-06-02T13:21:21Z	validation by library/open access desk
1	20.500.12860/39868*	2022-05-22T02:19:05Z