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Inspection and metrology challenges for 3 nm node devices and beyond

dc.contributor.authorShohjoh, T.
dc.contributor.authorIkota, M.
dc.contributor.authorIsawa, M.
dc.contributor.authorLorusso, Gian
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorBriggs, Basoene
dc.contributor.authorMertens, Hans
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorCharley, Anne-Laure
dc.date.accessioned2022-07-12T10:27:52Z
dc.date.available2022-07-09T02:28:03Z
dc.date.available2022-07-12T10:27:52Z
dc.date.issued2021
dc.identifier.issn2380-9248
dc.identifier.otherWOS:000812325400209
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40097.2
dc.sourceWOS
dc.titleInspection and metrology challenges for 3 nm node devices and beyond
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecDe Bisschop, Peter::0000-0002-8297-5076
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.identifier.doi10.1109/IEDM19574.2021.9720711
dc.identifier.eisbn978-1-6654-2572-8
dc.source.numberofpages4
dc.source.peerreviewyes
dc.source.conferenceIEEE International Electron Devices Meeting (IEDM)
dc.source.conferencedateDEC 11-16, 2021
dc.source.conferencelocationSan Francisco
dc.source.journalna
imec.availabilityPublished - imec


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220.500.12860/40097.2*2022-07-12T10:24:42Zvalidation by library/open access desk
120.500.12860/400972022-07-09T02:28:03Z

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