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Mitigation of the etch-induced intra-field overlay contribution
| dc.contributor.author | van Haren, Richard | |
| dc.contributor.author | Yildirim, Oktay | |
| dc.contributor.author | Mouraille, Orion | |
| dc.contributor.author | van Dijk, Leon | |
| dc.contributor.author | Kumar, Kaushik | |
| dc.contributor.author | Feurprier, Yannick | |
| dc.contributor.author | Jehoul, Christiane | |
| dc.contributor.author | Hermans, Jan | |
| dc.date.accessioned | 2023-02-16T11:41:14Z | |
| dc.date.available | 2022-09-08T02:39:17Z | |
| dc.date.available | 2023-02-16T11:41:14Z | |
| dc.date.issued | 2022 | |
| dc.identifier.isbn | 978-1-5106-4987-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.other | WOS:000844514700012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40385.2 | |
| dc.source | WOS | |
| dc.title | Mitigation of the etch-induced intra-field overlay contribution | |
| dc.type | Proceedings paper | |
| dc.contributor.imecauthor | Jehoul, Christiane | |
| dc.contributor.imecauthor | Hermans, Jan | |
| dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
| dc.identifier.doi | 10.1117/12.2614255 | |
| dc.identifier.eisbn | 978-1-5106-4988-0 | |
| dc.source.numberofpages | 12 | |
| dc.source.peerreview | no | |
| dc.source.conference | Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference | |
| dc.source.conferencedate | APR 24-MAY 27, 2020-2022 | |
| dc.source.conferencelocation | San Jose, CA | |
| dc.source.journal | NA | |
| dc.source.volume | 12056 | |
| imec.availability | Under review |
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