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Direct correlation between mask registration and on-wafer measurements for individual logic device features

dc.contributor.authorvan Haren, Richard J. F.
dc.contributor.authorSteinert, Steffen
dc.contributor.authorMouraille, Orion
dc.contributor.authorKasperkiewicz, Ewa
dc.contributor.authorHermans, Jan
dc.contributor.authorHasan, Mahmudul
dc.contributor.authorvan Dijk, Leon
dc.contributor.authorBeyer, Dirk
dc.date.accessioned2023-02-16T11:38:41Z
dc.date.available2023-02-15T03:23:35Z
dc.date.available2023-02-16T11:38:41Z
dc.date.issued2022
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000905312400019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41097.2
dc.sourceWOS
dc.titleDirect correlation between mask registration and on-wafer measurements for individual logic device features
dc.typeProceedings paper
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHasan, Mahmudul
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.identifier.doi10.1117/12.2641618
dc.identifier.eisbn978-1-5106-5642-0
dc.source.numberofpages12
dc.source.peerreviewno
dc.source.conferencePhotomask Technology Conference
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalNA
dc.source.volume12293
imec.availabilityUnder review


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    VersionItemDateSummary
    320.500.12860/41097.32023-04-28T10:17:58Zvalidation by library/open access desk
    220.500.12860/41097.2*2023-02-16T11:32:22Zvalidation by imec author
    120.500.12860/410972023-02-15T03:23:35Z

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