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Attenuated phase shift masks: an interview with Andreas Erdmann

dc.contributor.authorGallagher, Emily
dc.date.accessioned2023-03-01T03:27:46Z
dc.date.available2023-03-01T03:27:46Z
dc.date.issued2022-OCT 1
dc.identifier.issn1932-5150
dc.identifier.otherWOS:000924949300003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41204
dc.sourceWOS
dc.titleAttenuated phase shift masks: an interview with Andreas Erdmann
dc.typeEditorial material
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.identifier.doi10.1117/1.JMM.21.4.040402
dc.source.numberofpages1
dc.source.peerreviewyes
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.issue4
dc.source.volume21
imec.availabilityUnder review


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VersionItemDateSummary
320.500.12860/41204.32023-04-25T10:29:50Zvalidation by library/open access desk
220.500.12860/41204.22023-03-04T19:11:43Zvalidation by imec author
120.500.12860/41204*2023-03-01T03:27:46Z

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