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Studies on resolution with ZEP530A for EUV mask

dc.contributor.authorAkihide, Shirotori
dc.contributor.authorTsutsumi, Takashi
dc.contributor.authorYeh, Sin Fu
dc.contributor.authorKuroyanagi, Kenji
dc.date.accessioned2024-08-20T08:23:05Z
dc.date.available2024-06-06T18:30:27Z
dc.date.available2024-08-20T08:23:05Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-7218-5
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001222851800027
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43994.2
dc.sourceWOS
dc.titleStudies on resolution with ZEP530A for EUV mask
dc.typeProceedings paper
dc.contributor.imecauthorYeh, Sin Fu
dc.contributor.imecauthorAkihide, Shirotori
dc.date.embargo2024-04-09
dc.identifier.doi10.1117/12.3010109
dc.identifier.eisbn978-1-5106-7219-2
dc.source.numberofpages9
dc.source.peerreviewyes
dc.source.beginpage129560U
dc.source.conferenceConference on Novel Patterning Technologies
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12956
imec.availabilityPublished - open access


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220.500.12860/43994.2*2024-08-20T08:20:49Zvalidation by library/open access desk
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