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Study of EUV stochastic defect on wafer yield

dc.contributor.authorTsai, Yi-Pei
dc.contributor.authorChang, Chieh-Miao
dc.contributor.authorChang, Yi-Han
dc.contributor.authorOak, Apoorva
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorKim, Ryan Ryoung han
dc.date.accessioned2024-08-20T09:01:24Z
dc.date.available2024-06-15T17:25:02Z
dc.date.available2024-08-20T09:01:24Z
dc.date.issued2024
dc.identifier.isbn978-1-5106-7214-7
dc.identifier.issn0277-786X
dc.identifier.otherWOS:001224292100003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44032.2
dc.sourceWOS
dc.titleStudy of EUV stochastic defect on wafer yield
dc.typeProceedings paper
dc.contributor.imecauthorTsai, Yi-Pei
dc.contributor.imecauthorChang, Chieh-Miao
dc.contributor.imecauthorChang, Yi-Han
dc.contributor.imecauthorOak, Apoorva
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecOak, Apoorva::0000-0002-0926-848X
dc.contributor.orcidimecTrivkovic, Darko::0009-0003-7858-1802
dc.date.embargo2024-04-10
dc.identifier.doi10.1117/12.3010858
dc.identifier.eisbn978-1-5106-7215-4
dc.source.numberofpages8
dc.source.peerreviewyes
dc.source.beginpage1295404
dc.source.conferenceConference on DTCO and Computational Patterning III
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12954
imec.availabilityPublished - open access


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220.500.12860/44032.2*2024-08-20T08:58:34Zvalidation by library/open access desk
120.500.12860/440322024-06-15T17:25:02Z

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