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Effect of HF solution on the porous structure of low-k SICOH film

dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T13:45:52Z
dc.date.available2021-10-14T13:45:52Z
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4739
dc.sourceIIOimport
dc.titleEffect of HF solution on the porous structure of low-k SICOH film
dc.typeOral presentation
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference; October 2000; San Diego, Ca, USA.
dc.source.conferencelocation
imec.availabilityPublished - imec


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