Recently added

Selective wet etching of Hf-based layers

Snow, Jim; Claes, Martine; Paraschiv, Vasile; Kraus, Harald; Eitoku, Atsuro; Vos, Rita; Mertens, Paul; Boullart, Werner; De Gendt, Stefan; Heyns, Marc (2004)

Grain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): influence of the Ni content

Smeets, D.; Vantomme, Andre; Drijbooms, Chris; Bender, Hugo (2004)

Grain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): Influence of the Ni content

Smeets, D.; Detavernier, C.; Bender, Hugo; Vantomme, Andre (2004)

Integration challenges of SPER junctions for the 45 nm technology node

Severi, Simone; Richard, Lindsay; Henson, Kirklen; Pawlak, Bartek; Satta, Alessandra; Duffy, Ray; Surdeanu, Radu (2004)

Integration of SPER and FUSI in a pFET

Severi, Simone; Pawlak, Bartek; Veloso, Anabela; Duffy, Ray; Kottantharayil, Anil; Lauwers, Anne; Henson, Kirklen; de Marneffe, Jean-Francois; Eyben, Pierre; Vandervorst, Wilfried; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2004)

Process and substrate effects on the properties of MOCVD-deposited SrBi2Ta2O9 films

Schwitters, M.; Everaert, Jean-Luc; Lisoni, Judit; Paraschiv, Vasile; Goux, Ludovic; Wouters, Dirk; Monchoix, H.; Caputa, Concetta; Zambrano, R. (2004)

Identification of linear systems with nonlinear distortions

Schoukens, J. (2004)

ARIBA: a combined analysis set-up for high resolution RBS and TOF-ERDA for thin film analysis

Sajavaara, Timo; Brijs, Bert; Giangrandi, Simone; Arstila, Kai; Vantomme, Andre; Vandervorst, Wilfried (2004)

System identification techniques in microwave measurements for large signal network analysers

Rolain, Y.; Van Moer, W.; DeGroot, D. (2004)

A 90nm RF CMOS technology supported by device modelling and circuit demonstrators

Ramos, Javier; Mercha, Abdelkarim; Jeamsaksiri, Wutthinan; Linten, Dimitri; Jenei, Snezana; Thijs, Steven; Scholten, Andries; Wambacq, Piet; Debusschere, Ingrid; Decoutere, Stefaan (2004)

RF CMOS modelling for circuit design

Ramos, Javier; Mercha, Abdelkarim; Jeamsaksiri, Wutthinan; Linten, Dimitri; Jenei, Snezana; Thijs, Steven; Scholten, Andries; Wambacq, Piet; Debusschere, Ingrid; Decoutere, Stefaan (2004)

Mechanisme for the formation of metal oxide particles in ALD during the chemisorption of metal chlorides

Puurunen, Riikka (2004)

Research progress of work packages 6 and 7

Pintelon, R. (2004)

EPIC: a new force for advancing research, development and manufacturing of photonic components in Europe

Pearsall, Thomas P.; Van Daele, Peter (2004)

HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity

Paraschiv, Vasile; Claes, Martine; Baklanov, Mikhaïl; Boullart, Werner; De Gendt, Stefan; Vanhaelemeersch, Serge (2004)

Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions

Paraschiv, Vasile; Boullart, Werner; Vanhaelemeersch, Serge; Lisoni, Judit; Schwitters, Michael; Maes, David; Wouters, Dirk; Casella, P.; Zambrano, R.; Vecchio, G.; Van Autryve, Luc (2004)

Hierarchical rewriting and hiding of data dependent conditions to enable global loop transformations

Palkovic, Martin; Brockmeyer, Erik; Corporaal, Henk; Catthoor, Francky; Vounckx, Johan (2004)

Conductive oxides (RuO2.SrRuO3, La1-xSrxCoO3) thin films by means of aqueous CSD

Pagnaer, John; Vanhoyland, G.; D'Haen, Jan; Van Bael, Marlies; Van den Rul, Heidi; Mullens, J.; Van Poucke, L.C. (2004)

A study of the influence of typical wet chemical treatments on the germanium wafer surface

Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, I; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2004)

Surface cleaning and preparation related aspects of the germanium surface chemistry

Onsia, Bart; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Delabie, Annelies; Heyns, Marc; Mertens, Paul; Meuris, Marc; Sioncke, Sonja; Theuwis, A.; Van Elshocht, Sven; Van Steenbergen, Jan; Vinckier, Chris (2004)

Presentations: Recent submissions

Selective wet etching of Hf-based layers ﻿

Grain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): influence of the Ni content ﻿

Grain size and orientation in ternary Co1-xNixSi2 thin films on Si(100): Influence of the Ni content ﻿

Integration challenges of SPER junctions for the 45 nm technology node ﻿

Integration of SPER and FUSI in a pFET ﻿

Process and substrate effects on the properties of MOCVD-deposited SrBi2Ta2O9 films ﻿

Identification of linear systems with nonlinear distortions ﻿

ARIBA: a combined analysis set-up for high resolution RBS and TOF-ERDA for thin film analysis ﻿

System identification techniques in microwave measurements for large signal network analysers ﻿

A 90nm RF CMOS technology supported by device modelling and circuit demonstrators ﻿

RF CMOS modelling for circuit design ﻿

Mechanisme for the formation of metal oxide particles in ALD during the chemisorption of metal chlorides ﻿

Research progress of work packages 6 and 7 ﻿

EPIC: a new force for advancing research, development and manufacturing of photonic components in Europe ﻿

HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity ﻿

Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions ﻿

Hierarchical rewriting and hiding of data dependent conditions to enable global loop transformations ﻿

Conductive oxides (RuO2.SrRuO3, La1-xSrxCoO3) thin films by means of aqueous CSD ﻿

A study of the influence of typical wet chemical treatments on the germanium wafer surface ﻿

Surface cleaning and preparation related aspects of the germanium surface chemistry ﻿