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Tof-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides

dc.contributor.authorHoussiau, L.
dc.contributor.authorVitchev, R.G.
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T04:57:24Z
dc.date.available2021-10-15T04:57:24Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7667
dc.sourceIIOimport
dc.titleTof-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Secondary Ion Mass Spectrometry - SIMS XIV
dc.source.conferencedate14/09/2003
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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