| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Fyen, Wim | |
| dc.contributor.author | Vereecke, Guy | |
| dc.contributor.author | Xu, Kaidong | |
| dc.contributor.author | Lauerhaas, J. | |
| dc.contributor.author | Holsteyns, Frank | |
| dc.contributor.author | Van Doorne, Patrick | |
| dc.contributor.author | Kesters, Els | |
| dc.contributor.author | Vos, Rita | |
| dc.date.accessioned | 2021-10-15T05:44:03Z | |
| dc.date.available | 2021-10-15T05:44:03Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7899 | |
| dc.source | IIOimport | |
| dc.title | Damage-free removal of nano-sized particles, heading towards a red brick wall | |
| dc.type | Oral presentation | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.imecauthor | Vereecke, Guy | |
| dc.contributor.imecauthor | Holsteyns, Frank | |
| dc.contributor.imecauthor | Kesters, Els | |
| dc.contributor.imecauthor | Vos, Rita | |
| dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
| dc.source.peerreview | no | |
| dc.source.conference | International Sematech Wafer Cleaning and Surface Preparation Workshop | |
| dc.source.conferencedate | 1/05/2003 | |
| dc.source.conferencelocation | Austin, TX USA | |
| imec.availability | Published - imec | |