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Growth mechanism and properties of atomic atomic layer deposited ultra-thin TiN films

dc.contributor.authorSatta, Alessandra
dc.date.accessioned2021-10-15T06:29:57Z
dc.date.available2021-10-15T06:29:57Z
dc.date.issued2003-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8101
dc.sourceIIOimport
dc.titleGrowth mechanism and properties of atomic atomic layer deposited ultra-thin TiN films
dc.typePHD thesis
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.contributor.thesisadvisorVantomme, Andr�
dc.contributor.thesisadvisorMaex, Karen
imec.availabilityPublished - open access


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