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Challenges in FEOL for 45nm and beyond

dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-15T12:44:09Z
dc.date.available2021-10-15T12:44:09Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8591
dc.sourceIIOimport
dc.titleChallenges in FEOL for 45nm and beyond
dc.typeOral presentation
dc.contributor.imecauthorBiesemans, Serge
dc.source.peerreviewno
dc.source.conferenceInternational Conference Semiconductor Technology - ICTS
dc.source.conferencedate15/09/2004
dc.source.conferencelocationShangai China
imec.availabilityPublished - imec


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