Authors
Santoro, Gaetano;
Houchens, Kevin;
Bogdanowicz, Janusz;
Elizov, Moshe;
Yaron, Lior;
Chemama, Michael;
Goldenshtein, Alex;
Zakay, Amit;
Amit, Noam;
Briggs, Basoene;
Pacco, Antoine;
Delhougne, Romain;
Cockburn, Andrew;
Abramovitz, Yaniv;
Tam, Aviram;
Adan, Ofer;
Mertens, Hans;
Charley, Anne-Laure;
Horiguchi, Naoto;
Leray, Philippe;
Lorusso, Gian
EISBN
978-1-5106-4982-8
ISBN
978-1-5106-4981-1
ISSN
0277-786X
Conference
Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Volume
12053
Title
Recess metrology challenges for 3D device architectures in advanced technology nodes
Publication type
Proceedings paper
