Authors
Montero Alvarez, Daniel;
Buccheri, Nunzio;
Lin, Quyang;
Roy, Syamashree;
Paolillo, Sara;
Wu, Chen;
Hermans, Yannick;
Decoster, Stefan;
Baudemprez, Bart;
Finoulst, Jan-Frederik;
Lazzarino, Frederic;
Park, Seongho;
Tokei, Zsolt
EISBN
978-1-5106-7223-9
ISBN
978-1-5106-7222-2
ISSN
0277-786X
Conference
Conference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
Journal
Proceedings of SPIE
Volume
12958
Title
Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond
Publication type
Proceedings paper
