Recently added

The advantages of vacuum deposition as a technique to grow PVV-oligomer/C60 thin films for organic solar cell applications

Geens, Wim; Poortmans, Jef; Jain, Suresh; Nijs, Johan; Mertens, Robert (1999)

Integration HSQ into direct-on-metal approach for 0.25µm technology

Gao, Teng; Witvrouw, Ann; Coenegrachts, Bart; Bruynseraede, Christophe; Van Hove, Marleen; Maex, Karen (1999)

Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process

Gao, Teng; Gray, William; Van Hove, Marleen; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge (1999)

Cleaning, rinsing and drying aspects in post-Cu-CMP clean

Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heyns, Marc (1999)

The role of precursor chemistry in the ferroelectric properties of donor-doped Pb(Zr,Ti)O3 thin films

Fé, Laura; Norga, Gerd; Wouters, Dirk; Malic, B.; Kosec, M. (1999)

Optimization of an advanced positive DUV photoresist towards 150 nm and beyond

Ercken, Monique; Moelants, Myriam; Vandenberghe, Geert; Goethals, Mieke; Ronse, Kurt; Masuda, Seiya; Spiess, Walter; Pawlowski, G. (1999)

Non linear AD conversion, tolerant for pixel offset errors

Dierickx, Bart (1999)

Introduction to CMOS image sensors

Dierickx, Bart (1999)

Metastable and stable transistion-metal silicide layer formation in Si and SiGe

Dézsi, I.; Fetzer, C.; Bill, E.; Caymax, Matty; Pattyn, Hugo; Degroote, Sven; Langouche, G.; Vantomme, Andre (1999)

The influence of Ti capping layers on CoSi2 formation

Detavernier, C.; Donaton, R.; Maex, Karen; Van Meirhaeghe, R.; Cardon, F. (1999)

Choosing, commissioning and using tools for a painless planning process

Demeester, Piet; Colle, Didier (1999)

Qualitative determination of the altered layer as a function of ion fluence: buildup, thickness and composition

Deleu, Jeroen; Brijs, Bert; Vandervorst, Wilfried (1999)

Accurate determination of Si sputter yield in the transient region

Deleu, Jeroen; Brijs, Bert; Vandervorst, Wilfried (1999)

Silicon surface texturing by reactive ion etching

Dekkers, Harold; Duerinckx, Filip; Szlufcik, Jozef; Nijs, Johan (1999)

Two-dimensional profiling using scanning spreading resistance microscopy

De Wolf, Peter; Vandervorst, Wilfried; Clarysse, Trudo; Trenkler, Thomas; Hantschel, Thomas; Stephenson, Robert (1999)

MEMS for RF applications

De Raedt, Walter; Beccarini, Giuseppe; Rogge, Frank; Ziad, Hocine; Baert, Kris (1999)

Uncooled microbolometers for IR detection using surface micromachining of polySiGe

De Moor, Piet; Sedky, Sherif; Sabuncuoglu Tezcan, Deniz; Van Hoof, Chris (1999)

Precision particle spectroscopy with microcalorimeters in magnetic fields

De Moor, Piet; Belmans, Wouter; Baert, Kris; Van Hoof, Chris; Verbist, Agnes; Oberstedt, A.; Vanneste, L. (1999)

Physics based accurate extraction of Leff and Rs for deep submicron MOSFETs

De Meyer, Kristin (1999)

Growth and characterization of GaMnAs, a III-V diluted magnetic semiconductor

De Boeck, Jo; Borghs, Gustaaf; Van Esch, Ann; Van Bockstal, L. (1999)

Presentations: Recent submissions

The advantages of vacuum deposition as a technique to grow PVV-oligomer/C60 thin films for organic solar cell applications ﻿

Integration HSQ into direct-on-metal approach for 0.25µm technology ﻿

Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process ﻿

Cleaning, rinsing and drying aspects in post-Cu-CMP clean ﻿

The role of precursor chemistry in the ferroelectric properties of donor-doped Pb(Zr,Ti)O3 thin films ﻿

Optimization of an advanced positive DUV photoresist towards 150 nm and beyond ﻿

Non linear AD conversion, tolerant for pixel offset errors ﻿

Introduction to CMOS image sensors ﻿

Metastable and stable transistion-metal silicide layer formation in Si and SiGe ﻿

The influence of Ti capping layers on CoSi2 formation ﻿

Choosing, commissioning and using tools for a painless planning process ﻿

Qualitative determination of the altered layer as a function of ion fluence: buildup, thickness and composition ﻿

Accurate determination of Si sputter yield in the transient region ﻿

Silicon surface texturing by reactive ion etching ﻿

Two-dimensional profiling using scanning spreading resistance microscopy ﻿

MEMS for RF applications ﻿

Uncooled microbolometers for IR detection using surface micromachining of polySiGe ﻿

Precision particle spectroscopy with microcalorimeters in magnetic fields ﻿

Physics based accurate extraction of Leff and Rs for deep submicron MOSFETs ﻿

Growth and characterization of GaMnAs, a III-V diluted magnetic semiconductor ﻿