Recently added

Complexity analysis and guidelines for profile definition of still texture coding implementation

Lafruit, Gauthier; Peon, Mercedes; Vanhoof, Bart; Bormans, Jan (1998)

Complexity analysis of FCD still texture coding

Lafruit, Gauthier; Peon, Mercedes; Vanhoof, Bart; Bormans, Jan (1998)

Computational graceful degradation analysis in SNHC

Lafruit, Gauthier; Nachtergaele, Lode; Scherpenberg, Andy; Huybrechts, Tom; Bormans, Jan (1998)

Complexity analysis of OpenGL 3D rendering for computational graceful degradation

Lafruit, Gauthier; Gijbels, Toon; Scherpenberg, Andy; Huybrechts, Tom; Bormans, Jan (1998)

Refined proposal for definition of number of macroblocks per second

Lafruit, Gauthier; Gijbels, Toon (1998)

Description of experiments assessing the complexity of SNHC tools

Lafruit, Gauthier; Doenges, P.; Petajan, E.; Bormans, Jan; Mattavelli, M. (1998)

Recommendation for the definition of CGD parameters in the visual SNHC syntax

Lafruit, Gauthier; Bossen, F. (1998)

Recommendations for still texture coding (wavelets) implementations

Lafruit, Gauthier; Bormans, Jan; Mattavelli, M. (1998)

Complexity analysis of 3D mesh software

Lafruit, Gauthier; Bormans, Jan (1998)

Computational graceful degradation and backward compatibility

Lafruit, Gauthier; Bormans, Jan (1998)

Assesment of video spatial scalability complexity

Lafruit, Gauthier; Bormans, Jan (1998)

Implementation study group frequently asked questions

Lafruit, Gauthier (1998)

SiGe epitaxial layers for thin-film solar cells

Kruger, O.; Kittler, M.; Gutjahr, A.; Konuma, M.; Debarge, L.; Slaoui, A.; Said, Khalid; Poortmans, Jef (1998)

Characterization of HF-last cleaning of ion-implanted Si surfaces

Kondoh, Eiichi; Baklanov, Mikhaïl; Maex, Karen (1998)

Hydrogen peroxide decomposition in ammonin solutions

Knotter, D. M.; De Gendt, Stefan; Baeyens, Martien; Mertens, Paul; Heyns, Marc (1998)

Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth

Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1998)

Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface

Kim, Young-Chang; Caymax, Matty; Bender, Hugo; Vanhaelemeersch, Serge (1998)

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Kim, Young-Chang; Beckx, Stephan; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998)

The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface

Kim, Young-Chang; Baklanov, Mikhaïl; Conard, Thierry; Vanhaelemeersch, Serge; Vandervorst, Wilfried (1998)

Some challenges for mask making to keep up with the roadmap

Jonckheere, Rik; Randall, John; Marschner, Thomas; Ronse, Kurt (1998)

Presentations: Recent submissions

Complexity analysis and guidelines for profile definition of still texture coding implementation ﻿

Complexity analysis of FCD still texture coding ﻿

Computational graceful degradation analysis in SNHC ﻿

Complexity analysis of OpenGL 3D rendering for computational graceful degradation ﻿

Refined proposal for definition of number of macroblocks per second ﻿

Description of experiments assessing the complexity of SNHC tools ﻿

Recommendation for the definition of CGD parameters in the visual SNHC syntax ﻿

Recommendations for still texture coding (wavelets) implementations ﻿

Complexity analysis of 3D mesh software ﻿

Computational graceful degradation and backward compatibility ﻿

Assesment of video spatial scalability complexity ﻿

Implementation study group frequently asked questions ﻿

SiGe epitaxial layers for thin-film solar cells ﻿

Characterization of HF-last cleaning of ion-implanted Si surfaces ﻿

Hydrogen peroxide decomposition in ammonin solutions ﻿

Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth ﻿

Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface ﻿

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning ﻿

The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface ﻿

Some challenges for mask making to keep up with the roadmap ﻿

Complexity analysis and guidelines for profile definition of still texture coding implementation

Complexity analysis of FCD still texture coding

Computational graceful degradation analysis in SNHC

Complexity analysis of OpenGL 3D rendering for computational graceful degradation

Refined proposal for definition of number of macroblocks per second

Description of experiments assessing the complexity of SNHC tools

Recommendation for the definition of CGD parameters in the visual SNHC syntax

Recommendations for still texture coding (wavelets) implementations

Complexity analysis of 3D mesh software

Computational graceful degradation and backward compatibility

Assesment of video spatial scalability complexity

Implementation study group frequently asked questions

SiGe epitaxial layers for thin-film solar cells

Characterization of HF-last cleaning of ion-implanted Si surfaces

Hydrogen peroxide decomposition in ammonin solutions

Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth

Removal of Si-O, Si-C and Si-F by hydrogen bake after reactive ion etching on the silicon surface

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface

Some challenges for mask making to keep up with the roadmap