Recently added

Transient phenomena of silicon under oxygen bombardment

Deleu, Jeroen; Brijs, Bert; Vandervorst, Wilfried (1998)

Transient sputter yields of silicon with and without oxygen flooding

Deleu, Jeroen; Brijs, Bert; Vandervorst, Wilfried (1998)

Integration aspects of advanced CMOS processes

Deferm, Ludo (1998)

Ion induced oxidation of silicon by oxygen and argon bombardment in combination with oxygen flooding

De Witte, Hilde; Conard, Thierry; Gouttebaron, R.; Magnee, R.; Caudano, R.; Vandervorst, Wilfried; Gijbels, Toon (1998)

Ultra-thin oxide growth on silicon using ozonated solutions

De Smedt, Frank; Vinckier, Chris; Cornelissen, Ingrid; De Gendt, Stefan; Meuris, Marc; Gilis, G.; Heyns, Marc (1998)

Euregio Meuse-Rhine, and ideal location for microelectronics activities

De Keersmaecker, Roger (1998)

A novel resist and post-etch residue removal process using ozonated chemistry

De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998)

Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?

De Gendt, Stefan; Huber, A.; Onsia, Bart; Arnauts, Sophia; Kenis, Karine; Knotter, D. M.; Mertens, Paul; Heyns, Marc (1998)

Ozonated DI-water for clean chemical oxide growth

Cornelissen, Ingrid; Meuris, Marc; Wolke, K.; Wilkol, M.; Loewenstein, Lee; Doumen, Geert; Heyns, Marc (1998)

XPS study of the role of Ti and TiN caps on the Cobalt/SiO2 interface

Conard, Thierry; Kondoh, Eiichi; Vandervorst, Wilfried; Maex, Karen (1998)

XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Caymax, Matty; Loo, Roger; Verheyen, P.; Gijbels, Renaat (1998)

XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

Conard, Thierry; De Gendt, Stefan; Baklanov, Mikhaïl; Vos, Rita; Heyns, Marc; Vandervorst, Wilfried (1998)

Perspectives of silicon-on-insulator technologies for cryogenic electronics

Claeys, C.; Simoen, Eddy (1998)

Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods

Caymax, Matty; Decoutere, Stefaan; Röhr, Erika; Vandervorst, Wilfried; Heyns, Marc; Sprey, Hessel; Storm, Arjen; Maes, J.W. (1998)

Presentations: Recent submissions

Transient phenomena of silicon under oxygen bombardment

Transient sputter yields of silicon with and without oxygen flooding

Integration aspects of advanced CMOS processes

Ion induced oxidation of silicon by oxygen and argon bombardment in combination with oxygen flooding

Ultra-thin oxide growth on silicon using ozonated solutions

Euregio Meuse-Rhine, and ideal location for microelectronics activities

A novel resist and post-etch residue removal process using ozonated chemistry

Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?

Ozonated DI-water for clean chemical oxide growth

XPS study of the role of Ti and TiN caps on the Cobalt/SiO2 interface

XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

Perspectives of silicon-on-insulator technologies for cryogenic electronics

Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods

AApples: Advanced Applications of low temperature epitaxial Si alloys

Low-power data storage in (parallel) multi-media architectures

Memory optimizing code transformations for embedded multi-media applications

Low-power data storage in (parallel) multi-media architectures

Power-efficient data storage and transfer methodologies: current solutions and remaining problems

SPECTAC, a fully ethernet controlled Spectrum Acquisition Program for RBS, PIXE and NRA

Presentations: Recent submissions

Transient phenomena of silicon under oxygen bombardment ﻿

Transient sputter yields of silicon with and without oxygen flooding ﻿

Integration aspects of advanced CMOS processes ﻿

Ion induced oxidation of silicon by oxygen and argon bombardment in combination with oxygen flooding ﻿

Ultra-thin oxide growth on silicon using ozonated solutions ﻿

Euregio Meuse-Rhine, and ideal location for microelectronics activities ﻿

A novel resist and post-etch residue removal process using ozonated chemistry ﻿

Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination? ﻿

Ozonated DI-water for clean chemical oxide growth ﻿

XPS study of the role of Ti and TiN caps on the Cobalt/SiO2 interface ﻿

XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers ﻿

XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides ﻿

Perspectives of silicon-on-insulator technologies for cryogenic electronics ﻿

Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods ﻿

AApples: Advanced Applications of low temperature epitaxial Si alloys ﻿

Low-power data storage in (parallel) multi-media architectures ﻿

Memory optimizing code transformations for embedded multi-media applications ﻿

Low-power data storage in (parallel) multi-media architectures ﻿

Power-efficient data storage and transfer methodologies: current solutions and remaining problems ﻿

SPECTAC, a fully ethernet controlled Spectrum Acquisition Program for RBS, PIXE and NRA ﻿

Transient phenomena of silicon under oxygen bombardment

Transient sputter yields of silicon with and without oxygen flooding

Integration aspects of advanced CMOS processes

Ion induced oxidation of silicon by oxygen and argon bombardment in combination with oxygen flooding

Ultra-thin oxide growth on silicon using ozonated solutions

Euregio Meuse-Rhine, and ideal location for microelectronics activities

A novel resist and post-etch residue removal process using ozonated chemistry

Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?

Ozonated DI-water for clean chemical oxide growth

XPS study of the role of Ti and TiN caps on the Cobalt/SiO2 interface

XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

Perspectives of silicon-on-insulator technologies for cryogenic electronics

Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods

AApples: Advanced Applications of low temperature epitaxial Si alloys

Low-power data storage in (parallel) multi-media architectures

Memory optimizing code transformations for embedded multi-media applications

Low-power data storage in (parallel) multi-media architectures

Power-efficient data storage and transfer methodologies: current solutions and remaining problems

SPECTAC, a fully ethernet controlled Spectrum Acquisition Program for RBS, PIXE and NRA